Electroless selective deposition of gold nano-array for silicon nanowires growth
Abstract
Nanopatterns of gold clusters on a large surface of oriented Si(111) substrates, from the galvanic displacement of gold salt (via the spontaneous reduction of AuCl4-), are demonstrated in this work. The Si substrate is patterned by Focused Ion Beam (FIB) prior to being dipped in a gold solution. Here, we show that these patterns lead to successful control of the position and size of gold clusters. Sequential patterning reveals a powerful maskless alternative to surface preparation prior to Si nanowire growth.
Section
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How to Cite
Ruiz-Gomes, E. ., Herrier, C. ., Benkouider, A. ., Sudraud, P. ., Delobbe, A. ., Ronda, A. ., & Berbezier, I. . (2013). Electroless selective deposition of gold nano-array for silicon nanowires growth. Nanofabrication, 1, 1–7. Retrieved from https://ojs.bdtopten.com/33015.eaapublishing/index.php/nanofab/article/view/283
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Published: 2013-09-10
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Copyright (c) 2013 E. Ruiz-Gomes, C. Herrier, A. Benkouider, P. Sudraud, A. Delobbe, A. Ronda, I. Berbezier
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