Skip to main content Skip to main navigation menu Skip to site footer

Nano-proximity direct ion beam writing

  • Gediminas Seniutinas
  • Gediminas Gervinskas
  • Jose Anguita
  • Davit Hakobyan
  • Etienne Brasselet
  • Saulius Juodkazis

Abstract

Focused ion beam (FIB) milling with a 10 nm resolution is used to directly write metallic metasurfaces and micro-optical elements capable to create structured light fields. Surface density of fabricated nano-features, their edge steepness as well as ion implantation extension around the cut line depend on the ion beam intensity profile. The FIB beam intensity cross section was evaluated using atomic force microscopy (AFM) scans of milled line arrays on a thin Pt film. Approximation of two Gaussian intensity distributions describes the actual beam profile composed of central high intensity part and peripheral wings. FIB fabrication reaching aspect ratio of 10 in gold film is demonstrated.

Section

How to Cite

Seniutinas, G. ., Gervinskas, G. ., Anguita, J. ., Hakobyan, D. ., Brasselet, E. ., & Juodkazis, S. . (2016). Nano-proximity direct ion beam writing. Nanofabrication, 2, 54–62. Retrieved from https://ojs.bdtopten.com/33015.eaapublishing/index.php/nanofab/article/view/282

HTML
21

Total
17

Share

Search Panel

Downloads

Article Details

Published: 2016-02-25

Most Read This Month

License

Copyright (c) 2016 Gediminas Seniutinas, Gediminas Gervinskas, Jose Anguita, Davit Hakobyan, Etienne Brasselet, Saulius Juodkazis

Creative Commons License

This work is licensed under a Creative Commons Attribution-NoDerivatives 4.0 International License.